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Progress in Chemistry 2008, Vol. 20 Issue (11): 1659-1665 Previous Articles   Next Articles

• Review •

Preparation of Patterned TiO2 Thin Films

Liang Shan Miao Chen   

  • Received: Revised: Online: Published:
  • Contact: Miao Chen
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This article provides an overview of various patterning methodologies of TiO2 films, and it is organized into three major sections: Generation of patterns, replication of a mask, and replication of a master. Generation of patterns is usually accomplished by serial techniques, including the writhing process with a stylus, an electron beam or a laser beam, the self-assembly process and the photoelectromchemistry process. The patterned features on a mask are mainly used to direct a flux of radiation or physical matter from a source onto a substrate. This method can be carried out with photoresists, self assembled monolayers, and photosensitive gel films of TiO2. A master serves as the original for replication based on replica molding, transfer molding, molding in capillaries, microcontact printing and light stamping. The advantages and disadvantages of different methods are described. Some opinions on further studies on the preparation of patterned TiO2 films are also presented.

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Abstract

Preparation of Patterned TiO2 Thin Films