Advances in Research of Metallorganic Precursors for Ferroelectric Oxide Thin Films via MOCVD

Kong Xiangrong,Liu Junliang,Zeng Yanwei*

Progress in Chemistry ›› 2005, Vol. 17 ›› Issue (05) : 839-846.

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Progress in Chemistry ›› 2005, Vol. 17 ›› Issue (05) : 839-846.
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Advances in Research of Metallorganic Precursors for Ferroelectric Oxide Thin Films via MOCVD

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2005, 17(05): 839-846

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