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Progress in Chemistry 2004, Vol. 16 Issue (02): 243- Previous Articles   Next Articles

• Review •

Progress in the Synthesis of Poly(4-Hydroxystyrene) for Polymer Photoresists

Meng Shiyun;Li Guangxian*;Yang Qi;Huang Yajiang   

  1. (The School of Polymer Materials Science and Technology, Sichuan University, Chengdu 610065, China)
  • Received: Revised: Online: Published:
  • Contact: Li Guangxian
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With the development of the integrate circuit chip technology, more and more attentions have been paid to the synthesis of polymer photoresists with homogeneous chemical and physical features, for the reason that the fabricating polymer photoresists based on poly (4-hydroxystyrene) became one of the key technologies for making the O.llμm chip. In this paper, the methods of synthesizing nan-ow dispersing polymer photoresists based on poly (4-hydroxystyrene) was reviewed and compared with each other, in order to provide a useful guide for the synthesizing polymer photoresists based on poly (4-hydroxystyrene).
Key words: p-hydroxystyrene, photoresists, living polymerization

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