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Progress in Chemistry 2003, Vol. 15 Issue (05): 374- Previous Articles   Next Articles

• Review •

Preparation of Titanium Nitride by Chemical Vapor Deposition

Wang Shutao;Zhang Zude*   

  1. (Department of Chemistry, University of Science and Technology of China, Hefei 230026, China)
  • Received: Revised: Online: Published:
  • Contact: Zhang Zude
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Based on the preparation of titanium nitride, the effects for the choice of the precursor on the CVD systems have been illustrated. The advances of chemical vapor deposition in the field of material preparation were reviewed.
Key words: chemical vapor deposition, precursor, titanium nitride, preparation

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