
Advanced Design of Block Copolymers for Nanolithography
Chen Leilei, Tao Yongxin, Hu Xin, Feng Hongbo, Zhu Ning, Guo Kai
Progress in Chemistry ›› 2023, Vol. 35 ›› Issue (11) : 1613-1624.
Advanced Design of Block Copolymers for Nanolithography
{{custom_ref.label}} |
{{custom_citation.content}}
{{custom_citation.annotation}}
|
/
〈 |
|
〉 |