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Progress in Chemistry 2022, Vol. 34 Issue (3): 609-615 DOI: 10.7536/PC210419 Previous Articles   Next Articles

• Review •

Fast Self-Assembly Methods of Block Copolymer Thin Films

Yuling Liu1, Tengda Hu2, Yilian Li1, Yang Lin2, Borsali Redouane3(), Yingjie Liao2()   

  1. 1 School of Materials Science and Engineering, Shanghai University,Shanghai 200444, China
    2 School of Mechanical and Electrical Engineering and Automation, Shanghai University,Shanghai 200444, China
    3 University Grenoble Alpes, Grenoble 38000, France
  • Received: Revised: Online: Published:
  • Contact: Borsali Redouane, Yingjie Liao
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Block copolymer (BCP) thin films can undergo microphase separation through different annealing techniques into large-scale cylindrical, lamellar, spherical or gyroidal nanopatterns. These long-range ordered nanopatterns have been widely used in many fields such as nanolithography, electronics, etc. At present, effective and rapid annealing methods are still a hot research topic in BCP thin film self-assembly. This article first introduces the commonly used annealing techniques for preparing BCP nanopatterns, then summarizes three new types of rapid annealing techniques, and finally analyzes and summarizes the advantages and disadvantages of these annealing techniques.

Contents

1 Introduction

2 Traditional annealing methods of block copolymer thin film self-assembly

2.1 Thermal annealing

2.2 Solvent annealing

3 Rapid annealing methods of block copolymer thin film self-assembly

3.1 Microwave annealing

3.2 Laser annealing

3.3 Solvothermal annealing

4 Conclusion and outlook

Key words: rapid self-assembly, block copolymers, thin film, annealing methods
Fig.1 (a) Schematic of block copolymer (BCP) thin film preparation and self-assembly;(b) BCP mask for photolithography[16]; (c) application in electroluminescent devices[20]; (d) protein ultrafiltration membrane[21]; (e) resistive memory devices[23]
Fig.2 Self-assembly patterns obtained under different annealing methods: (a) thermal annealing[24]; (b) solvent vapor annealing[12]; (c) laser annealing[35]; (d) solvothermal annealing[24] ; (e) microwave annealing[34]
Fig.3 Schematic diagram of various annealing systems of microwave annealing technology and the morphology of self-assembled block copolymer thin films after microwave annealing[29,31,34]
Fig.4 (a) Schematic of laser spike annealing and SEM image after film self-assembly[57]; (b) Schematic diagram of laser annealing vacuum chamber and typical samples and SEM image after film self-assembly[35]
Fig.5 Schematic of two solvothermal annealing systems and the self-assembled BCP patterns after solvothermal annealing[24,40]
Table 1 The annealing time required for different species of BCP materials using different annealing technologies
Annealing technology BCP Annealing time ref
Thermal annealing PI-b-PMMA > 4 h 2
PDMS-b-PMMA 1 h~11 h 6
PS-b-PDMS 3 h~18 h 24
Solvent annealing PS-b-P2VP 1 h~7 days 7
MH-b-PS 24 h 12
Microwave annealing PS-b-P2VP 3 min 34
PS-b-PMMA 30 s~6 min 29
MH-b-PS 5 s~3 min 31
Laser annealing PS-b-PDMS 10 ms~100 ms 36
PS-b-PMMA 15 s~30 min 35
Solvothermal annealing PS-b-PDMS 5 min 24
PS-b-PDMS 30 s~5 min 40
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