| MAX | MXene | Etching condition | delamination method | ref | |
|---|---|---|---|---|---|
| etchant | Temp [ ℃] | ||||
| Nb2AlC | Nb2CTx | HF | RT | No | |
| Ti3AlC2 | Ti3C2Tx | HF | RT | No | |
| Ti3AlC2 | Ti3C2Tx | HCl/LiF | 35 | handshake/ultrasonication +Metal ion | |
| Ti3AlC2 | Ti3C2Tx | NH4OH | RT | No | |
| Mo2Ga2C | Mo2CTx | HF | 55 | TBOAH+ ultrasonication | |
| Zr3Al3C2 | Zr3C2Tx | HF | rt | No | |
| Ti3AlC2 | Ti3C2Tx | KHF2/ NaHF2 | 60 | No | |
| Ti4AlN3 | Ti4N3Tx | LiF/NaF Molten salt | 550 | TBOAH+ ultrasonication | |
| Ti3AlC2 | Ti3C2Tx | TMAOH | rt | handshake | |
| Ti3AlC2 | Ti3C2Tx | TBAOH | rt | ultrasonication | |
| Ti3AlC2 | Ti3C2Tx | NaOH | 270 | DMSO+stirring | |
| Ti2AlC | Ti2CTx | HCl electrochemistry | rt | No | |
| Ti3AlC2 | Ti3C2Tx | NH4Cl+ TMAOH electrochemistry | rt | No | |
| Ti3AlC2 Ti2AlC Ti2AlN V2AlC | Ti3C2Cl2 Ti2CCl2 Ti2NCl2 V2C Cl2 | ZnCl2 Molten salt | 550 | No | |
| Ti3SiC2 | Ti3C2Cl2 | CuCl2 Molten salt | 750 | No | |
