化学进展

气敏新材料MXenes在呼出气体传感器中的应用

朱继秀, 陈巧芬, 倪梯铜, 陈爱民, 邬建敏

化学进展, 2021, 33(2): 232-242. DOI: 10.7536/PC200506

Precursor type	Composition	Etching method	MXene	ref
M₂AX 211	Ti₂AlC	10% conc.-10 h-RT	Ti₂CT_x	49
	V₂AlC	50% conc.-90 h-RT	V₂CT_x	53
	Nb₂AlC	50% conc.-90 h-RT	Nb₂CT_x	53
M₃AX₂ 312	Ti₃AlC₂	50% conc.-2 h-RT	Ti₃C₂T_x	48
	Ti₃SiC₂	HF 30% conc. + H₂O₂ 35% conc.-45 h-40 ℃	Ti₃C₂T_x	62
	Ti₃AlCN	30% conc.-18 h-RT	Ti₃CNT_x	49
M₄AX₃ 413	V₄AlC₃	40% conc.-165 h-RT	V₄C₃T_x	54
	Nb₄AlC₃	49% conc.-140 h-RT	Nb₄C₃T_x	55
	Ta₄AlC₃	50% conc.-72 h-RT	Ta₄C₃T_x	49