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化学进展 2008, Vol. 20 Issue (12): 1903-1908 前一篇   后一篇

• 综述与评论 •

含N、S官能基聚硅烷*

王鹏 丁云桥 冯圣玉** 张洁   

  1. (山东大学化学与化工学院 济南 250100)

  • 收稿日期:2008-02-26 修回日期:2008-04-02 出版日期:2008-12-24 发布日期:2008-12-25
  • 通讯作者: 冯圣玉

N,S-Containing Functional Polysilanes

Wang Peng; Ding Yunqiao; Feng Shengyu**; Zhang Jie   

  1. (School of Chemistry and Chemical Engineering, Shandong University, Jinan 250100, China)
  • Received:2008-02-26 Revised:2008-04-02 Online:2008-12-24 Published:2008-12-25
  • Contact: Feng Shengyu
综述了近年来含N、S官能基聚硅烷的研究进展。介绍了吡啶、联吡啶、吡咯等含N官能基与噻吩、硫代官能团等含S官能基取代聚硅烷的制备和光电性能表征,概括了含N,S官能团聚硅烷的分子设计、物理性能与应用领域。最后展望了含N、S官能团聚硅烷研究的发展方向与应用前景。
The recent progress in study of N,S-containing functional polysilanes is reviewed in this paper. Synthesis and photoelectric characterizations of N,S-containing functional polysilanes are introduced. As shown in this paper, N-containing functional groups, such as pyridine, bispyridine and pyrrole, and S-containing functional groups including thiophere, sulfide functional groups are discussed. The molecular design, physical characters and applied areas of N,S-containing functional polysilanes are summarized. The developing trend of study on N,S-containing functional polysilane and application of new materials are forecasted.

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摘要

含N、S官能基聚硅烷*