English
新闻公告
More
化学进展 2003, Vol. 15 Issue (02): 123- 前一篇   后一篇

• 综述与评论 •

金属表面自组装缓蚀功能分子膜*

杨学耕1;陈慎豪1,2**;马厚义1;全贞兰1;李德刚1   

  1. (1. 山东大学化学与化工学院 济南 250100; 2.中国科学院金属研究所 金属腐蚀与防护国家重点实验室 沈阳 110015)
  • 收稿日期:2002-05-01 修回日期:2002-09-01 出版日期:2003-03-24 发布日期:2003-03-24
  • 通讯作者: 陈慎豪

Inhibitive Self-Assembled Monolayers on Metal Surface

Yang Xuegeng1;Chen Shenhao1,2**;Ma Houyi1;Quan Zhenlan1;Li Degang1   

  1. (1. School of Chemistry and Chemical Engineering,Shandong University, Jinan 250100, China; 2. State Key Laboratory for Corrosion and Protection of Matels, Institute of Metal Research, CAS, Shenyang 110015, China)
  • Received:2002-05-01 Revised:2002-09-01 Online:2003-03-24 Published:2003-03-24
  • Contact: Chen Shenhao
本文总结了近年来自组装单分子膜技术在金属腐蚀与防护领域中的应用,重点介绍了几类比较成熟的自组装体系,评价了几种常用的表征技术,概括了近年来本课题组在该研究领域中的一些成果,并对自组装技术今后的发展作了预测。
Self-assembled monolayers (SAMs) play an important role in surface science, chemical engineering and materials science because of their relevance to both applied and fundamental studies. In this paper the application of self-assembled monolayers in the field of corrosion and protection of metals in recent years is summarized. Some representative self-assembly systems are introduced in detail. In addition, some common characterization technologies are evaluated, and the research results of our group are presented. The development of this technique in the future is also predicted.

中图分类号: 

()

[ 1 ] Ulman A. Chem. Rev. , 1996, 96: 1533—1554
[ 2 ] Spector M S, Schnur J M. Science, 1997, 275: 791—792
[ 3 ] Sowerby S J , Michael E W , Wolfgang M H. J. Phys.Chem. , 1998, 102: 5914—5922
[ 4 ] Sowerby S J , Stockwell P A , Heckel W M , et al. Origins Life Eovl. Biosphere, 2000, 30: 81—99
[ 5 ] Sowerby S J , Heckl W M. Origins Life Eovl. Biosphere,1998, 28: 283—310
[ 6 ] Rdler J O, Koltover I, Salditt T, et al. Science, 1997,275: 810—814
[ 7 ] Wirth M J , Fairbank R W P, Hafeez O F. Science, 1996,275: 44—47
[ 8 ] Swalen J D, Allara D L , Andrade J D, et al. Langmuir,1987, 3: 932
[ 9 ] Zerkowski J , McDonald J C, Seto C T, et al. J. Am.Chem. Soc. , 1994, 116: 2382—2391
[ 10 ] Ducharme Y, Wuest J D. J. Org. Chem. , 1988, 53:5787—5789
[ 11 ] Jie D, Goh S H, Lee S Y, et al. Polymer, 1993, 34:4314—4318
[ 12 ] Elwards A , Osborne C, Webster S, et al. Corros. Sci. ,1994, 36: 315—325
[ 13 ] Laibinis P E, Whitesides G M , Allara D L. J. Am.Chem. Soc. , 1991, 113: 7152—7167
[ 14 ] Yamamoto Y, Nishihara H, Aramaki K. J. Elctrochem.Soc. , 1993, 140: 436—443
[ 15 ] 杨生荣(Yang S R) , 任嗣利(Ren S L ) , 张俊彦(Zhang J Y) , 张绪寿(Zhang X S). 高等学校化学学报(Chem. J.Chin. Univ. ) , 2001, 22: 470—476
[ 16 ] 邓文礼(Deng W L ) , 杨林静(Yang L J ) , 王琛(Wang C) ,白春礼(Bai C L ). 科学通报(Chin. Sci. Bull. ) , 1998,43: 449—457
[ 17 ] Yoneyama H. Langmuir, 1997, 13: 5215—5217
[ 18 ] Sung M M , Sung K, Chang G K, et al. J. Phys. Chem.B, 2000, 104: 2273—2277
[ 19 ] Rubinstein I. J. Phys. Chem. B, 1998, 102: 9861—9869
[ 20 ] Tao Y Y, Hietpas G D, Allara D L. J. Am. Chem. Soc. ,1996, 118: 6724—6735
[ 21 ] Crooks R M. Langmuir, 1998, 14: 3279—3286
[ 22 ] Azzaroni O , Cipollone M , Vela M E, Salvrezza R C.Langmuir, 2001, 17: 1483—1487
[ 23 ] Laibinis P E, Whitesides G M. J. Am. Chem. Soc. ,1992, 114: 1990—1995
[ 24 ] A ramak i K. Co rro s. Sci. , 1999, 41: 57—73
[ 25 ] Itoh M , Nishihara H, Aramaki K. J. Electrochem. Soc. ,1994, 141: 2018—2023
[ 26 ] Itoh M , Nishihara H, Aramaki K. J. Electrochem. Soc. ,1995, 142: 3696—3704
[ 27 ] Haneda R, Nishihara H, Aramaki K. J. Electrochem.Soc. , 1997, 144: 1215—1221
[ 28 ] Haneda R, Aramaki K. J. Electrochem. Soc. , 1998, 145:1856—1861
[ 29 ] Haneda R, Aramaki K. J. Electrochem. Soc. , 1998, 145:2786—2791
[ 30 ] Ishibashi M , Itoh M , Nishihara H, et al. Electrochim.Acta, 1996, 41: 241—248
[ 31 ] Tao Y T. J. Am. Chem. Soc. , 1993, 115: 4350—4358
[ 32 ] Feng Y Q , Teo W H, Siow K K, et al. J. Electrochem.Soc. , 1997, 144: 55—64
[ 33 ] 李德刚(Li D G) , 陈慎豪(Chen S H ) , 杨学耕(Yang X G) , 尹秉胜(Yin B S) , 赵世勇(Zhao S Y). 第十一届全国电化学会议论文集(上集). 南京, 2001. A 013
[ 34 ] Statmann M. Adv. Mater. , 1990, 2: 191
[ 35 ] Volmer M , Statmann M , Viefhaus H. Surf. Interface Anal. , 1990, 16: 278—282
[ 36 ] Volmer M , Czodrowski B, Statmann M. Ber. Bunsenges.Phys. Chem. , 1988, 92: 1335
[ 37 ] Mekhalif Z, Riga J , Pireaux J J , et al. Langmuir, 1997,13: 2285—2290
[ 38 ] Seal S, Sap re K, Kale A , et al. Corros. Sci. , 2000, 42:1623—1634
[ 39 ] San-Miguel M A , Rodger P M. Journal of Molecular Structure: Theochem. , 2000, 506: 263—272
[ 40 ] Melissa J , David K. Journal of Electroanalytical Chemistry, 1992, 340: 301—313
[ 41 ] Ramachandran S, Tsai B L , Blanco M , Chen H, Tang Y C, William A G. Langmuir, 1996, 12: 6419—6428
[ 42 ] Ramachandran S, Blanco M , Chen H, Tang Y C, William A G. J. Phys. Chem. A , 1997, 101: 83—89
[ 43 ] McMahon A J. Colloids and Surfaces, 1991, 59: 187—208
[ 44 ] Desai M N , Desai B, Shan C B, Desai S M. Corros. Sci. ,1986, 26: 827—837
[ 45 ] Bilgic S, Caliskan N. J. Applied Electrochem. , 2001, 31:79—83
[ 46 ] Li S L , Ma H Y, Lei S B, Yu R, Chen S H, Liu D X.Corrosion, 1998, 54: 947—954
[ 47 ] Li S L , Chen S H, Lei S B, Ma H Y, Yu R, Liu D X.Corros. Sci. , 1999, 41: 1273—1287
[ 48 ] Li S L , Wang Y G, Chen S H, Yu R, Lei S B, Ma H Y,Liu D X. Corros. Sci. , 1999, 41: 1769—1782
[ 49 ] 马厚义(Ma H Y) , 陈慎豪(Chen S H) , 全贞兰(Quan Z L) , 牛林(Niu L ) , 李淑兰(Li S L ). 电化学(Electrochemistry) , 2000, 6: 31—39
[ 50 ] Ma H Y, Chen S H, Niu L , Shang S X, Li S L , Zhao S Y, Quan Z L. J. Electrochem. Soc. , 2001, 148: B208—B216
[ 51 ] Ma H, Chen S, Niu L , Zhao S, Li D. J. Appl. Electrochem. , 2002, 32: 65—72
[ 52 ] 全贞兰(Quan ZL ) , 陈慎豪(Chen S H) , 华兰(Hua L ) , 雷圣宾(Lei S B) , 崔学桂(Cui X G). 科学通报(Chin. Sci.Bull. ) , 2001, 46: 1618—1621
[ 53 ] Quan Z L , Wu X J , Chen S H, Zhao S Y, Ma H Y.Corr. , 2001, 57: 195—201
[ 54 ] Quan Z L , Chen S H, Li S L. Corros. Sci. , 2001, 43:1071—1080
[ 55 ] Quan Z L , Chen S H, Li Y, Cui X G. Corros. Sci. , 2002,44: 703—715
[ 56 ] Quan Z L , Chen S H, Cui X G, Li Y. Corrosion, 2002,58: 248—256
[ 57 ] Quan Z L , Chen S H, Hua L , Lei S B, Cui X G. Chinese Science Bulletin, 2002, 47: 990—993
[ 58 ] 白春礼, 田芳, 罗克. 扫描力显微术. 北京: 科学出版社,2000
[ 59 ] Widrig C A , Chung C K, Porter M D. J. Electroanyl. ,1991, 310: 335—355
[ 60 ] Sabatani E, Rubinstein I. J. Phys. Chem. , 1987, 91:6663—6669
[ 61 ] Sabatani E, Boulakia J C, Bruening M , Rubinstein I.Langmuir, 1993, 9: 2974—2981
[ 62 ] Ma H Y, Li G Q , Chen S H, Zhao S Y, Cheng X L. Corr.Sci. , 2002, 44: 1177—1191
[ 63 ] 曹楚南. 腐蚀电化学原理. 北京: 化学工业出版社, 1985.172
[ 64 ] 查全性. 电极过程动力学导论. 北京: 科学出版社, 1993.174
[ 65 ] 曹楚南(Cao C N ). 腐蚀科学与防护技术(Corr. Sci. Protec. Tech. ) , 1993, 5: 1
[ 66 ] 华中一, 罗维昂. 表面分析. 上海: 复旦大学出版社,1989. 127
[ 67 ] Binning G, Rohrer H. Surf. Sci. , 1983, 126: 236—244
[ 68 ] 万立骏(Wan L J ) , 徐庆敏(Xu Q M ) , 白春礼(Bai C L ).电子显微学报(Journal of Chinese Electron Microscopy Society) , 2001, 20: 167—172
[ 69 ] Binning G, Gerber C F, Gerber C. Phys. Rev. Lett. ,1986, 456: 930
[ 70 ] 徐国华(Xu G H ) , Higashitani K. 高等学校化学学报(Chem. J. Chin. Univ. ) , 2000, 21: 1257
[ 71 ] Jennings G K, Munro J C, Yong T H, Laibinis P E.Langmuir, 1998, 14: 6130—6139
[ 72 ] 朱自莹, 顾仁敖, 陆天虹. 拉曼光谱在化学中的应用. 沈阳: 东北大学出版社, 1998. 242—243
[ 73 ] Andrew R. Molecular Modeling, Principles and Applications. 北京: 世界图书出版公司, 1997
[ 74 ] 罗明道(Luo M D) , 毕刚(Bi G) , 旷富贵(Kuang F G) , et al. 化学学报(Acta Chimica Sinica) , 1994, 52: 620—624
[ 75 ] 唐子龙(Tang Z L ) , 宋诗哲(Song S Z ). 中国腐蚀与防护学报(J. Chin. Soc. Corr. Prot. ) , 1995, 15: 229—236
[ 76 ] 全贞兰(Quan Z L ). 博士学位论文( Doctoral Dissertation). 山东大学(Shandang Univ. ) , 2001

[1] 张俊苓 杨芳 郑文杰 白燕 欧阳健明. 自组装单分子膜及其表征方法*[J]. 化学进展, 2005, 17(02): 203-208.
[2] 孔德生,万立骏,陈慎豪. 电化学STM技术在金属腐蚀科学中的应用及研究进展*[J]. 化学进展, 2004, 16(02): 204-.
阅读次数
全文


摘要

金属表面自组装缓蚀功能分子膜*